Mechanical properties of TiN films with preferred orientation by nano-indentation method
Matsumuro Akihito; Watanabe Tomohiko; Hayashi Toshiyuki; Muramatsu Mutsuo; Takahashi Yutaka
Abstract:TiN films with the (111) and (200) preferred orientations were formed on Si(100) and sapphire(0001) substrates by ion-beam-assisted deposition. In order to clarify the relationship between the preferred orientation of the TiN films and the mechanical properties of the hardness H and the elastic moduli E*, nano-indentation studies with a Berkovich indenter were carried out. Their experiments revealed significant differences in H and E* irrespective of substrate materials; i.e., Hav = 9 GPa, E*av = 192 GPa for the (111) preferred orientation and Hav = 16 GPa, E*av = 316 GPa for the (200) preferred orientation. It could be considered that these differences were attributed to the intrinsic crystallographic anisotropy in a TiN crystal. Key Words:Mechanical properties, TiN film, Prefered orientation, Ion-beam-assisted deposition, Nano-indentation method