Amorphous Region of ZnO-SiO2 and TiO2-SiO2 Systems by Sputtering Method
Takashi Wakasugi, Yuko Morohashi and Rikuo Ota
Abstract: Amorphous films in the ZnO-SiO2 and TiO2-SiO2 systems were prepared by sputtering method and the amorphous region was determined. The compositional difference in the film from that of the target used to prepare it indicated that the order of sputtering rate is TiO2 < SiO2 < ZnO. The amorphous region of ZnO-SiO2 system was narrower than that of MgO-SiO2 and CaO-SiO2 systems. Physical properties of these systems were compared. Two possible reasons were suggested for the difference of the amorphous region. One is the difference of glass structure and the other is the defect of oxygen in the amorphous films. The amorphous region of the TiO2-SiO2 system was narrower than that of the ZnO-SiO2 system and this was attributed to the strong tendency for phase separation. Key Words:Sputtering, Amorphous film, ZnO-SiO2, TiO2-SiO2